Calibration Method to Eliminate Zeroth Order Effect in Lateral Shearing Interferometry

Chao FANG; Yang XIANG; Keqi QI; Dawei CHEN

doi:10.1007/s13320-018-0500-2

[1] Y. Q. Yu, Y. F. Zhang, Z. L. Ou, X. Chen, Q. D. Huang, and S. C. Ruan, “Simultaneous measurement of one dimensional bending and temperature based on Mach-Zehnder interferometer,” Photonic Sensors, 2015, 5(4): 376-384.

[2] L. C. Zhang, X. K. Cai, and G. Shi, “Optical coatings for DUV lithography,” Chinese Optics, 2015, 8(2): 169-181.

[3] S. T. Gao, D. C. Wu, and E. L. Miao, “Distortion correcting method when testing large-departure asphere,” Chinese Optics, 2017, 10(3): 383-390.

[4] F. Wang, X. Z. Wang, M. Y. Ma, D. Q. Zhang, W. J. Shi, and J. M. Hu, “Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask,” Applied Optics, 2006, 45(2): 281-287.

[5] F. Z. Dai, J. Li, X. Z. Wang, and Y. Bu, “Exact two-dimensional zonal wavefront reconstruction with high spatial resolution in lateral shearing interferometry,” Optics Communications, 2016, 367: 264-273.

[6] M. Takeda and S. Kobayashi, “Lateral aberration measurements with a digital Talbot interferometer,” Applied Optics, 1984, 23(11): 1760-1764.

[7] M. Hasegawa, C. Ouchi, T. Hasegawa, S. Kato, A. Ohkubo, A. Suzuki, et al., “Recent progress of EUV wave-front metrology in EUVA,” SPIE, 2004, 5533: 27-36.

[8] H. Schreiber and J. Schwider, “Lateral shearing interferometer based on two Ronchi gratings in series,” Applied Optics, 1997, 36(22): 5321- 5324.

[9] F. Z. Bai, X. Q. Wang, K. Z. Huang, and F. Tian, “Analysis of spatial resolution and pinhole size for single-shot point-diffraction interferometer using in closed-loop adaptive optics,” Optics Communications, 2013, 297(12): 27-31.

[10] S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, and J. Bokar, “Phase-shifting point-diffraction interferometry at 193 nm,” Applied Optics, 2013, 39(31): 5768-5772.

[11] K. A. Goldberg, P. Naulleau, P. Denham, and E. H. Anderson, “EUV interferometric testing and alignment of the 0.3-NA MET optic,” SPIE, 2004, 5374(7): 64-73.

[12] P. Gao, I. Harder, V. Nercissian, K. Mantel, and B. Yao, “Phase-shifting point-diffraction interferometry with common-path and in-line configuration for microscopy,” Optics Letters, 2010, 35(5): 712-714.

[13] R. Miyakawa, P. Naulleau, and K. Goldberg, “Analysis of systematic errors in lateral shearing interferometry for EUV optical testing,” SPIE, 2009, 7272: 1-6.

[14] Y. C. Zhu, K. Sugisaki, C. Ouchi, M. Hasegawa, M. Niibe, A. Suzuki, et al., “Lateral shearing interferometer for EUVL: theoretical analysis and experiment,” in Proceeding of Conference on Emerging Lithographic Technologies VIII, Santa Clara, CA, USA, 2004, pp. 824- 832.

[15] C. Fang, Y. Xiang, K. Q. Qi, C. L. Zhang, and C. S. Yu, “An 11-frame phase shifting algorithm in lateral shearing interferometry,” Optics Express, 2013, 21(23): 28325-28333.

[16] P. Hariharan, “Digital phase-stepping interferometry: effects of multiply reflected beams,” Applied Optics, 1987, 26(13): 2506-2507.