• Acta Optica Sinica
  • Vol. 38, Issue 7, 0712007 (2018)
Guanji Dong1、2、*, Feng Tang1、3, Xiangzhao Wang1、2, Peng Feng1, Fudong Guo1, and Changzhe Peng1、2
Author Affiliations
  • 1 Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
  • 3 State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China
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    DOI: 10.3788/AOS201838.0712007 Cite this Article Set citation alerts
    Guanji Dong, Feng Tang, Xiangzhao Wang, Peng Feng, Fudong Guo, Changzhe Peng. Study on High Precision Magnification Measurement of Imaging Systems[J]. Acta Optica Sinica, 2018, 38(7): 0712007 Copy Citation Text show less
    References

    [1] Gao B. Research on the large field projection lithograph lens[D]. Hangzhou: Zhejiang University, 33-49(2006).

    [2] Xu W X, Qiao W D, Yang J D et al. Study about distortion measurement of NFOV lens based on star point method[J]. Laser Technology, 35, 593-595(2011).

    [3] Xu W C, Huang W, Yang W. Magnification tolerancing and compensation for the lithographic projection lens[J]. Acta Optica Sinica, 31, 1122003(2011).

    [4] Deng C, Xing T W, Lin W M et al. Design and simulation of large field plate lithography lens[J]. Proceedings of SPIE, 9685, 96850V(2016). http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2577717

    [5] Wang F, Wang X Z, Ma M Y et al. An novel technique for measuring full image quality of lithography tools in situ[J]. Chinese Journal of Lasers, 33, 543-548(2006).

    [6] Shi W J, Wang X J, Zhang D Q et al. Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks[J]. Optical Engineering, 45, 53201(2006).

    [7] Ma T, Shen Y B. Distortion detect of large field projection lithography lens[J]. Acta Photonica Sinica, 34, 46-49(2005).

    [8] van de Kerkhof M, Jasper H, Levasier L et al. . Enabling sub-10 nm node lithography: presenting the NXE: 3400B EUV scanner[J]. Proceedings of SPIE, 10143, 101430D(2017). http://www.spie.org/Publications/Proceedings/Paper/10.1117/12.2258025

    [9] Goldberg K A. Extreme ultraviolet interferometry[D]. Berkeley: University of California, 69-76(1997).

    Guanji Dong, Feng Tang, Xiangzhao Wang, Peng Feng, Fudong Guo, Changzhe Peng. Study on High Precision Magnification Measurement of Imaging Systems[J]. Acta Optica Sinica, 2018, 38(7): 0712007
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