Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

Swe Z. Oo; Antulio Tarazona; Ali Z. Khokhar; Rafidah Petra; Yohann Franz; Goran Z. Mashanovich; Graham T. Reed; Anna C. Peacock; Harold M. H. Chong

doi:10.1364/PRJ.7.000193

Journals >Photonics Research >Volume 7 >Issue 2 >Page 193 > Article

Photonics Research
Vol. 7, Issue 2, 193 (2019)

Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

Swe Z. Oo^1、2、*, Antulio Tarazona², Ali Z. Khokhar², Rafidah Petra¹, Yohann Franz², Goran Z. Mashanovich², Graham T. Reed^2、3, Anna C. Peacock², and Harold M. H. Chong¹

Author Affiliations

¹School of Electronics and Computer Science, University of Southampton, SO17 1BJ, UK

²Optoelectronics Research Centre, University of Southampton, SO17 1BJ, UK

³School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, Singapore

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DOI: 10.1364/PRJ.7.000193 Cite this Article Set citation alerts

Swe Z. Oo, Antulio Tarazona, Ali Z. Khokhar, Rafidah Petra, Yohann Franz, Goran Z. Mashanovich, Graham T. Reed, Anna C. Peacock, Harold M. H. Chong. Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices[J]. Photonics Research, 2019, 7(2): 193 Copy Citation Text

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