• Photonics Research
  • Vol. 11, Issue 12, 2159 (2023)
Tianxun Gong1, Boyuan Yan1, Taiping Zhang2, Wen Huang1, Yuhao He1, Xiaoyu Xu3、4, Song Sun3、4、5、*, and Xiaosheng Zhang1、6、*
Author Affiliations
  • 1School of Integrated Circuit Science and Engineering (Exemplary School of Microelectronics), University of Electronic Science and Technology of China, Chengdu 611731, China
  • 2Tianfu Xinglong Lake Laboratory, Chengdu 610299, China
  • 3Microsystem and Terahertz Research Center, China Academy of Engineering Physics, Chengdu 610200, China
  • 4Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621900, China
  • 5e-mail: sunsong_mtrc@caep.cn
  • 6e-mail: zhangxs@uestc.edu.cn
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    DOI: 10.1364/PRJ.500883 Cite this Article Set citation alerts
    Tianxun Gong, Boyuan Yan, Taiping Zhang, Wen Huang, Yuhao He, Xiaoyu Xu, Song Sun, Xiaosheng Zhang. Fano resonance-enhanced Si/MoS2 photodetector[J]. Photonics Research, 2023, 11(12): 2159 Copy Citation Text show less
    (a) Effect of changing nanoparticle size on the Fano resonance dip position. (b) Effect of changing nanoparticle spacing on the Fano resonance dip position. (c) Effect of changing the number of particles (heptamer, hexamer, and pentamer) on the Fano resonance dip position. (d) Surface current density and displacement current distribution (arrows) at 600 nm. (e) Surface current density and displacement current distribution (arrows) at the Fano dip wavelength (785 nm). (f) Calculated normalized electric field distribution of the heptamer structure.
    Fig. 1. (a) Effect of changing nanoparticle size on the Fano resonance dip position. (b) Effect of changing nanoparticle spacing on the Fano resonance dip position. (c) Effect of changing the number of particles (heptamer, hexamer, and pentamer) on the Fano resonance dip position. (d) Surface current density and displacement current distribution (arrows) at 600 nm. (e) Surface current density and displacement current distribution (arrows) at the Fano dip wavelength (785 nm). (f) Calculated normalized electric field distribution of the heptamer structure.
    (a) Schematic of the photodetector. (b) SEM image of the photodetector. (c) SEM images of the photodetectors of the control group. (d) Raman spectra of the MoS2 on devices. (e) Schematic illustration of the internal photoemission in the Au-MoS2 Schottky junction. (f) Energy band diagram of Si/MoS2.
    Fig. 2. (a) Schematic of the photodetector. (b) SEM image of the photodetector. (c) SEM images of the photodetectors of the control group. (d) Raman spectra of the MoS2 on devices. (e) Schematic illustration of the internal photoemission in the Au-MoS2 Schottky junction. (f) Energy band diagram of Si/MoS2.
    I-V characteristic curves of devices at (a) 450 nm, (b) 520 nm, (c) 635 nm, (d) 785 nm, and (e) 1064 nm, respectively.
    Fig. 3. I-V characteristic curves of devices at (a) 450 nm, (b) 520 nm, (c) 635 nm, (d) 785 nm, and (e) 1064 nm, respectively.
    (a) Responsivity and detectivity of the device at different optical powers. (b) I-T response of the proposed device. (c) Comparison of the responsivity of the device and the control.
    Fig. 4. (a) Responsivity and detectivity of the device at different optical powers. (b) I-T response of the proposed device. (c) Comparison of the responsivity of the device and the control.
    (a) Heptamer structure. R is the radius of AuNPs, and g is the distance between the central nanoparticles and the surrounding nanoparticles. (b) Schematic diagram of the hexamer. (c) Schematic diagram of the pentamer.
    Fig. 5. (a) Heptamer structure. R is the radius of AuNPs, and g is the distance between the central nanoparticles and the surrounding nanoparticles. (b) Schematic diagram of the hexamer. (c) Schematic diagram of the pentamer.
    (a) Schematic view of the silicon substrate with a hole array. (b) Silicon substrate with oligomer structures. (c) Substrate with a few layers of MoS2 transferred above. (d) Two electrodes were prepared on two ends of the MoS2. (e) Enlarged view of the oligomer on the device.
    Fig. 6. (a) Schematic view of the silicon substrate with a hole array. (b) Silicon substrate with oligomer structures. (c) Substrate with a few layers of MoS2 transferred above. (d) Two electrodes were prepared on two ends of the MoS2. (e) Enlarged view of the oligomer on the device.
    (a) SEM picture of the fabricated nanohole array. (b) Side view of the nanohole.
    Fig. 7. (a) SEM picture of the fabricated nanohole array. (b) Side view of the nanohole.
    (a) Schematic of the CAPA method. (b)–(d) SEM images of the CAPA effect.
    Fig. 8. (a) Schematic of the CAPA method. (b)–(d) SEM images of the CAPA effect.
    SEM images of the oligomers on hole array substrate.
    Fig. 9. SEM images of the oligomers on hole array substrate.
    Reflectance spectrum of the oligomers on the hole array substrate.
    Fig. 10. Reflectance spectrum of the oligomers on the hole array substrate.
    DeviceR (A/W)D (Jones)λ (nm)References
    Si-MoS2 heterojunction524.4×109785This work
    Si-MoS2 heterojunction0.31013808[19]
    Si-MoS2 heterojunction11.92.1×1010650[20]
    Si-MoS2 heterojunction91014550[21]
    Si-MoS2 heterojunction76.11.6×1012660[18]
    Monolayer MoS2 phototransistor880/561[38]
    Few-layer MoS2 phototransistor0.571010532[3]
    Table 1. Performance Comparison of Photodetector-Based MoS2
    Tianxun Gong, Boyuan Yan, Taiping Zhang, Wen Huang, Yuhao He, Xiaoyu Xu, Song Sun, Xiaosheng Zhang. Fano resonance-enhanced Si/MoS2 photodetector[J]. Photonics Research, 2023, 11(12): 2159
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