• Acta Optica Sinica
  • Vol. 40, Issue 9, 0931001 (2020)
Jinyan Wang1、2, Jinlong Zhang1、2、*, Hongfei Jiao1、2, and Xinbin Cheng1、2
Author Affiliations
  • 1Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China
  • 2MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, 200092, China
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    DOI: 10.3788/AOS202040.0931001 Cite this Article Set citation alerts
    Jinyan Wang, Jinlong Zhang, Hongfei Jiao, Xinbin Cheng. Study on High Reflective Film in 121.6 nm Far Ultraviolet[J]. Acta Optica Sinica, 2020, 40(9): 0931001 Copy Citation Text show less
    References

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    [13] Rodríguez-de Marcos L V, Larruquert J I, Méndez J A et al. Self-consistent optical constants of MgF2, LaF3, and CeF3 films[J]. Optical Materials Express, 7, 989-1006(2017).

    [14] Liu M C, Lee C C, Kaneko M et al. Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm[J]. Applied Optics, 45, 7319-7324(2006). http://www.onacademic.com/detail/journal_1000035234157610_6a0f.html

    [15] Yu H, Cui Y, Shen Y M et al. Design, preparation and characterization of 355 nm antireflection coatings[J]. Chinese Journal of Lasers, 35, 2026-2030(2008).

    Jinyan Wang, Jinlong Zhang, Hongfei Jiao, Xinbin Cheng. Study on High Reflective Film in 121.6 nm Far Ultraviolet[J]. Acta Optica Sinica, 2020, 40(9): 0931001
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