Jinyan Wang, Jinlong Zhang, Hongfei Jiao, Xinbin Cheng. Study on High Reflective Film in 121.6 nm Far Ultraviolet[J]. Acta Optica Sinica, 2020, 40(9): 0931001
- Acta Optica Sinica
- Vol. 40, Issue 9, 0931001 (2020)
Fig. 1. Reflectance spectrum designed for Cr+Al+MgF2 samples
Fig. 2. Reflectance at central wavelength of 121.6 nm for LaF3/MgF2 samples under different designs. (a) Different film stacks; (b) different thickness ratios of H to L
Fig. 3. Measured reflectance spectra of Al+MgF2 samples under different conditions. (a) Different deposition processes; (b) different annealing temperatures
Fig. 4. Roughness of different Al+MgF2 samples. (a) Sample A; (b) sample B; (c) sample C
Fig. 5. Reflectance comparison of LaF3/MgF2 samples prepared at room temperature
Fig. 6. Reflectance of LaF3/MgF2 samples prepared at room temperature under different annealing processes
Fig. 7. Roughness of LaF3/MgF2 samples prepared at room temperature. (a) No annealing; (b) annealing-200 ℃/2 h; (c) annealing-250 ℃/2 h; (d) annealing-300 ℃/2 h
Fig. 8. Surfaces of LaF3/MgF2 samples prepared at room temperature. (a) No annealing; (b) annealing-200 ℃/2 h; (c) annealing-250 ℃/2 h; (d) annealing-300 ℃/2 h
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Table 1. Parameters for Al+MgF2 sample
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Table 2. Reflectance and scattering parameters of Al+MgF2 samples at 121.6 nm
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Table 3. Reflectance and scattering parameters at 122.5 nm of LaF3/MgF2 samples prepared at room temperature
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