• Laser & Optoelectronics Progress
  • Vol. 58, Issue 17, 1714004 (2021)
Xinpeng Li1、2, Deyang Yu1、*, Qikun Pan1, Ranran Zhang1、2, Kuo Zhang1, Jin Guo1, and Fei Chen1
Author Affiliations
  • 1State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun , Jilin 130033, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/LOP202158.1714004 Cite this Article Set citation alerts
    Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004 Copy Citation Text show less
    Schematic diagram of laser beam jitter. (a) Δy; (b) Δθ; (c) Δy+Δθ
    Fig. 1. Schematic diagram of laser beam jitter. (a) Δy; (b) Δθ; (c) Δy+Δθ
    Schematic diagram of angular deviation measurement
    Fig. 2. Schematic diagram of angular deviation measurement
    Schematic diagram of beam monitoring and control
    Fig. 3. Schematic diagram of beam monitoring and control
    Steady-state error of position before control
    Fig. 4. Steady-state error of position before control
    Steady state error of position after control. (a) 1‒102 s; (b) 255‒357 s; (c) 750‒852 s
    Fig. 5. Steady state error of position after control. (a) 1‒102 s; (b) 255‒357 s; (c) 750‒852 s
    Beam pointing stability
    Fig. 6. Beam pointing stability
    AlignmentBeforeAfter
    1‒204 s1‒102 s255‒357 s750‒852 s
    X axis error /μm±3±1.6±1.4±1.3
    Y axis error /μm±6±3.1±2.9±3.4
    Table 1. Jitter of center of mass before and after beam alignment
    Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004
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