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Journals >Laser & Optoelectronics Progress >Volume 58 >Issue 17 >Page 1714004 > Article

Laser & Optoelectronics Progress
Vol. 58, Issue 17, 1714004 (2021)

Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System

Xinpeng Li^1、2, Deyang Yu^1、*, Qikun Pan¹, Ranran Zhang^1、2, Kuo Zhang¹, Jin Guo¹, and Fei Chen¹

Author Affiliations

¹State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun , Jilin 130033, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP202158.1714004 Cite this Article Set citation alerts

Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004 Copy Citation Text

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Abstract

A beam alignment system for extreme ultraviolet lithography light source system is designed to meet the requirement of beam pointing stability of extreme ultraviolet lithography light source system and ensure the conversion efficiency of extreme ultraviolet light. The alignment system is composed of two parts, the beam jitter detection module and the beam alignment module. By analyzing the beam jitter mechanism and beam control principle, a closed-loop alignment system with detection and control is built based on the virtual instrument development software LabVIEW. The experimental results show that after the beam passes through the alignment system, the jitter amplitude in the horizontal direction is less than 2 μm, the jitter amplitude in the vertical direction is less than 4 μm, and the pointing stability is less than 6 μrad, which meets the requirements of the light source system for the beam pointing stability.

Keywords

beam jitter beam stabilization closed-loop control extreme ultraviolet lithography laser optics

Δ y = θ \times f

，（1）

ξ_{i}^{2} = ξ_{x_{i}}^{2} + ξ_{y_{i}}^{2} = {(ξ_{x_{i}^{'}} - \bar{X})}^{2} + {(ξ_{y_{i}^{'}} - \bar{Y})}^{2}

，（2）

S_{ξ} = \sqrt[]{\sum_{i} ξ_{i}^{2} / (n - 1)}

，（3）

ξ_{α} = \sqrt[]{2} S_{ξ} / f

。（4）

(\begin{matrix} Δ X_{1} \\ Δ Y_{1} \\ Δ X_{2} \\ Δ Y_{2} \end{matrix}) = K (\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix})

，（5）

(\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix}) = (\begin{matrix} A_{11} & A_{12} & A_{13} & A_{14} \\ A_{12} & A_{22} & A_{23} & A_{24} \\ A_{31} & A_{32} & A_{33} & A_{34} \\ A_{41} & A_{42} & A_{43} & A_{44} \end{matrix}) (\begin{matrix} Δ X_{1} \\ Δ Y_{1} \\ Δ X_{2} \\ Δ Y_{2} \end{matrix})

，（6）

(\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix}) = A (\begin{matrix} Δ X_{1} \\ Δ Y_{1} \\ Δ X_{2} \\ Δ Y_{2} \end{matrix}) = A K (\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix}) = B (\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix})

，（7）

(\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix}) = B^{- 1} (\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix})

。（8）

(\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix}) = g_{g a i n} \cdot B^{- 1} (\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix})

。（9）

(\begin{matrix} Δ U_{X 1} (k) \\ Δ U_{Y 1} (k) \\ Δ U_{X 2} (k) \\ Δ U_{Y 2} (k) \end{matrix}) = K_{P} \cdot B^{- 1} (\begin{matrix} Δ C_{C A M X 1} (k) - Δ C_{C A M X 1} (k - 1) \\ Δ C_{C A M Y 1} (k) - Δ C_{C A M Y 1} (k - 1) \\ Δ C_{C A M X 2} (k) - Δ C_{C A M X 2} (k - 1) \\ Δ C_{C A M Y 2} (k) - Δ C_{C A M Y 2} (k - 1) \end{matrix}) + K_{I} * B^{- 1} (\begin{matrix} Δ C_{C A M X 1} (k) \\ Δ C_{C A M Y 1} (k) \\ Δ C_{C A M X 2} (k) \\ Δ C_{C A M Y 2} (k) \end{matrix})

，（10）

(\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix}) = (\begin{matrix} B_{11} & B_{12} & B_{13} & B_{14} \\ B_{12} & B_{22} & B_{23} & B_{24} \\ B_{31} & B_{32} & B_{33} & B_{34} \\ B_{41} & B_{42} & B_{43} & B_{44} \end{matrix}) (\begin{matrix} Δ U_{X 1} \\ Δ U_{Y 1} \\ Δ U_{X 2} \\ Δ U_{Y 2} \end{matrix})

。（11）

(\begin{matrix} Δ C_{C A M X 1} \\ Δ C_{C A M Y 1} \\ Δ C_{C A M X 2} \\ Δ C_{C A M Y 2} \end{matrix}) = (\begin{matrix} B_{11} & B_{12} & B_{13} & B_{14} \\ B_{12} & B_{22} & B_{23} & B_{24} \\ B_{31} & B_{32} & B_{33} & B_{34} \\ B_{41} & B_{42} & B_{43} & B_{44} \end{matrix}) (\begin{matrix} Δ U_{X 1} \\ 0 \\ 0 \\ 0 \end{matrix})

。（12）

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Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004

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