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    Journals >Laser & Optoelectronics Progress >Volume 58 >Issue 17 >Page 1714004 > Article
    • Laser & Optoelectronics Progress
    • Vol. 58, Issue 17, 1714004 (2021)
    Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System
    Xinpeng Li1、2, Deyang Yu1、*, Qikun Pan1, Ranran Zhang1、2, Kuo Zhang1, Jin Guo1, and Fei Chen1
    Author Affiliations
  • 1State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun , Jilin 130033, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/LOP202158.1714004 Cite this Article Set citation alerts
    Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004 Copy Citation Text show less
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    Article index updated: May. 18, 2024
    Citation counts are provided from Researching.
    The article is cited by 6 article(s) from Researching.
    Abstract
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    Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004
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    Paper Information
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