[2] Erdmann A[J]. Arnz M. The impact of aberration averaging during step-and-scan on the photolithographic process. Microelectronic Engineering, 41/42, 117-120(1998).
[4] Ma M Y, Wang X Z, Wang F et al. Novel method for measuring coma with fine overlay test marks[J]. Acta Optica Sinica, 26, 1037-1042(2006).
[5] Wang L, Li S K, Wang X Z et al. Source mask projector optimization method of lithography tools based on particle swarm optimization algorithm[J]. Acta Optica Sinica, 37, 1022001(2017).
[7] van der Laan H, Dierichs M, van Greevenroek H et al. . Aerial image measurement methods for fast aberration set-up and illumination pupil verification[J]. Proceedings of SPIE, 4346, 394-407(2001).
[11] Zhu B E, Wang X Z, Li S K et al. Aberration measurement method for hyper-NA lithographic projection lens[J]. Acta Optica Sinica, 36, 0112002(2016).
[12] Zhu B E, Wang X Z, Li S K et al. High-order aberration measurement method for hyper-NA lithographic projection lens[J]. Acta Optica Sinica, 37, 0412003(2017).
[14] Wong A K K[M]. Optical imaging in projection micro-lithography(2005).
[15] Yang J S, Wang X Z, Li S K et al. In situ aberration measurement method based on a phase-shift rings target[J]. Acta Optica Sinica, 34, 0211004(2014).
[16] Born M, Wolf E[M]. Principles of optics, 411-417(1998).
[18] Jolliffe I[M]. Principal component analysis, 150-165(2002).
[19] Rawlings J O, Pantula S D, Dickey D A[M]. Applied regression analysis: a research tool, 93-97(2008).
[20] Lai K. Gallatin G M, van de Kerkhof M A, et al. New paradigm in lens metrology for lithographic scanner: evaluation and exploration[J]. Proceedings of SPIE, 5377, 160-171(2004).
[22] Shen L N, Li S K, Wang X Z et al. Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality[J]. Proceedings of SPIE, 9426, 94261E(2015).
[23] Shen L N, Wang X Z, Li S K et al. Measuring method of polarization aberration based on vector aerial image of alternating phase-shift mask[J]. Acta Optica Sinica, 36, 0811003(2016).