Boer Zhu, Sikun Li, Xiangzhao Wang, Fengzhao Dai, Feng Tang, Lifeng Duan. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations[J]. Acta Optica Sinica, 2018, 38(7): 0712004
- Acta Optica Sinica
- Vol. 38, Issue 7, 0712004 (2018)
Fig. 1. Schematic of an optical lithographic imaging system
Fig. 2. Schematic of linear sampling
Fig. 3. Process of high-order wave aberration based on the proposed technique
Fig. 4. Illumination types. (a) x-polarization; (b) y-polarization
Fig. 5. Schematic of the test target at different directions
Fig. 6. Aerial images. (a) x-polarized illumination; (b) y-polarized illumination; (c) difference of polarized illumination between x and y directions
Fig. 7. Measurement results (Z5-Z64) obtained by the proposed technique
Fig. 8. Measurement results (Z5-Z64) obtained by the previous method. (a) x-polarized illumination; (b) y-polarized illumination
Fig. 9. Polarized illumination types. (a) Radial polarization; (b) tangential polarization
Fig. 10. Measurement results (Z5-Z64) obtained by the proposed technique
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Table 1. Simulation settings
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Table 2. High-order aberrations measurement results at different illuminations
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