High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

Boer Zhu; Sikun Li; Xiangzhao Wang; Fengzhao Dai; Feng Tang; Lifeng Duan

doi:10.3788/AOS201838.0712004

Journals >Acta Optica Sinica >Volume 38 >Issue 7 >Page 0712004 > Article

Acta Optica Sinica
Vol. 38, Issue 7, 0712004 (2018)

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

Boer Zhu^1、2, Sikun Li^1、2、*, Xiangzhao Wang^1、2, Fengzhao Dai^1、2, Feng Tang^1、2, and Lifeng Duan³

Author Affiliations

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

³ Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai 201203, China

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DOI: 10.3788/AOS201838.0712004 Cite this Article Set citation alerts

Boer Zhu, Sikun Li, Xiangzhao Wang, Fengzhao Dai, Feng Tang, Lifeng Duan. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations[J]. Acta Optica Sinica, 2018, 38(7): 0712004 Copy Citation Text

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