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    Journals >Acta Optica Sinica >Volume 42 >Issue 9 >Page 0912002 > Article
    • Acta Optica Sinica
    • Vol. 42, Issue 9, 0912002 (2022)
    Scratch Evolution for Monocrystalline Silicon During Chemical-Mechanical Polishing
    Jingjing Xia, Jun Yu*, Zhanshan Wang, and Siwen Lu
    Author Affiliations
  • Institute Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    DOI: 10.3788/AOS202242.0912002 Cite this Article Set citation alerts
    Jingjing Xia, Jun Yu, Zhanshan Wang, Siwen Lu. Scratch Evolution for Monocrystalline Silicon During Chemical-Mechanical Polishing[J]. Acta Optica Sinica, 2022, 42(9): 0912002 Copy Citation Text show less
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    Article index updated: May. 20, 2024
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    Jingjing Xia, Jun Yu, Zhanshan Wang, Siwen Lu. Scratch Evolution for Monocrystalline Silicon During Chemical-Mechanical Polishing[J]. Acta Optica Sinica, 2022, 42(9): 0912002
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