• Chinese Journal of Quantum Electronics
  • Vol. 21, Issue 3, 273 (2004)
[in Chinese]1、2、*, [in Chinese]3、4, [in Chinese]5, and [in Chinese]5
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3Department of Physics,Tokyo University of Science,1-3 Kagurazaka,Shinjuku-ku,162-8601,Tokyo,Japan
  • 4[in Chinese]
  • 5[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study and prospect of Si-based optoelectronics[J]. Chinese Journal of Quantum Electronics, 2004, 21(3): 273 Copy Citation Text show less

    Abstract

    Si-based optoelectronics is becoming a very active research area due to its potential applications for optical communications. One of the major goals of this study is to realize all-Si optoelectronic integrated circuit. We mainly reviewed the current developments of this exciting field in the recent years. The involved contents indude the design of direct bandgap Si-based low dimensional materials, fabrication of ordered Si-based nanocrystalline films and approach of stable and high-efficient Si-based light-emitting devices. Finally, we predicate the developed tendency of all-Si optoelectronic integrated technology in the near future.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study and prospect of Si-based optoelectronics[J]. Chinese Journal of Quantum Electronics, 2004, 21(3): 273
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