Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng; Sikun Li; Xiangzhao Wang; Zinan Zhang

doi:10.3788/AOS202040.1005001

Journals >Acta Optica Sinica >Volume 40 >Issue 10 >Page 1005001 > Article

Acta Optica Sinica
Vol. 40, Issue 10, 1005001 (2020)

Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng^1、2, Sikun Li^1、2、*, Xiangzhao Wang^1、2、**, and Zinan Zhang^1、2

Author Affiliations

¹Laboratory of Information Optics and Opt-electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/AOS202040.1005001 Cite this Article Set citation alerts

Wei Cheng, Sikun Li, Xiangzhao Wang, Zinan Zhang. Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask[J]. Acta Optica Sinica, 2020, 40(10): 1005001 Copy Citation Text

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Wei Cheng, Sikun Li, Xiangzhao Wang, Zinan Zhang. Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask[J]. Acta Optica Sinica, 2020, 40(10): 1005001

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