
- Journal of Semiconductors
- Vol. 43, Issue 4, 040101 (2022)
Abstract
Characterization of materials and devices is fundamental to the understanding of structure-property relationship and improving device performance. Driven by the rapid progress achieved in semiconductors research, advanced characterization techniques at high spatial resolution are being developed, with the capability to reveal microstructures down to atomic or sub-atomic scale. Coupled with in-situ and in-operando techniques, responses of materials and devices under multiple external stimuli can be investigated at both high spatial resolution and high time resolution, providing in-depth understanding of the growth, reaction, defects evolution and degradation mechanism etc. with unprecedented details.
This special issue assembles 6 review articles providing a timely summary of advanced in-situ and in-operando characterization techniques, covering areas of traditional semiconductor devices, organic semiconductor devices, metal oxide semiconductors, photocatalysts, and halide perovskites.
Jiang et al. dedicate the review to the up-to-date developments in the in-situ/operando optical, scanning probe microscopy, and spectroscopy techniques specifically for organic semiconducting films and devices[
Zhang et al. introduce a comprehensive approach of defect study, i.e., a series mode, to address the issues of traditional parallel mode where defects investigated by structural characterization techniques were not the same defect that affected the device[
Li et al. deliverer a comprehensive review on quantitative transmission electron microscopy (TEM) characterization where off-axis electron holography is introduced in detail[
Fang et al. summarize the recent progress ofin-situ characterization techniques on exploring the dynamic behavior of catalyst materials and reaction intermediates[
Zhao et al. review the recent progress regarding the mechanical deformation mechanisms in metal oxide semiconductors, such as CuO and ZnO nanowires (NWs), using in-situ TEM[
Wu et al. provide a timely review on recent studies of the halide perovskites using advanced TEM characterization[
We sincerely hope this special issue could provide timely review and perspective on the development of emerging in-situ/operando characterization techniques and their contributions to unveil the structure-property relationship in semiconductor materials and devices, and ultimately improve the device performance. We also hope this special issue could not only benefit the on-going research in lab and industry by introducing cutting-edge characterization techniques, but also inspire more creative approaches to be developed for semiconductors research in the coming future.
We would like to thank all the authors for their outstanding contributions to this special issue. We are also grateful to the editorial and production staff of the Journal of Semiconductors for their kind assistance.
References
[1] S Jiang, Q Y Dai, J H Guo et al. In-situ/operando characterization techniques for organic semiconductors and devices. J Semicond, 43, 041101(2022).
[2] Y Zhang, D J Smith. Comprehensive,
[3] L Y Li, Y F Cheng, Z Y Liu et al. Study of structure-property relationship of semiconductor nanomaterials by quantitative transmission electron microscopy. J Semicond, 43, 041103(2022).
[4] Z Fang, Y Liu, C Y Song et al. In-situ monitoring of dynamic behavior of catalyst materials and reaction intermediates in semiconductor catalytic processes. J Semicond, 43, 041104(2022).
[5] P L Zhao, L Li, G X J Chen et al. Structural evolution of low-dimensional metal oxide semiconductors under external stress. J Semicond, 43, 041105(2022).
[6] X M Wu, X X Ke, M L Sui. Recent progress on advanced transmission electron microscopy characterization for halide perovskite semiconductors. J Semicond, 43, 041106(2022).

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