• Chinese Optics Letters
  • Vol. 16, Issue 9, 091402 (2018)
Xin Guo*, Jinbin Ding, Yi Zhou, and Yu Wang
Author Affiliations
  • Academy of Opto-Electronics, Chinese Academy of Sciences, Beijing 100094, China
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    DOI: 10.3788/COL201816.091402 Cite this Article Set citation alerts
    Xin Guo, Jinbin Ding, Yi Zhou, Yu Wang. Ablation effects and mechanism of sintered silicon carbide ceramics by an ArF excimer laser[J]. Chinese Optics Letters, 2018, 16(9): 091402 Copy Citation Text show less

    Abstract

    The ablation of sintered silicon carbide ceramics by an ArF excimer laser was studied. Three zones are generated: the ablation zone that presented molten morphology and was composed by the Si and C phase; the condensation zone formed by vaporized SiC; and the oxidation zone that showed the characteristics of thermal oxidation. The ablation depth and oxidation range increase linearly with fluence and pulses within 0.5–4 J/cm2, but the normalized ablation efficiency is constant (3.60 ± 0.60 μm·mm2/J). The theoretical photochemical ablation depth supplies 25% of the total depth at 1 J/cm2 but decreases to 16% at 4 J/cm2. The ablation is dominated by the photothermal effect and conforms to the thermal evaporation mechanism.
    Dpc=1αlnFFth,(1)

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    Xin Guo, Jinbin Ding, Yi Zhou, Yu Wang. Ablation effects and mechanism of sintered silicon carbide ceramics by an ArF excimer laser[J]. Chinese Optics Letters, 2018, 16(9): 091402
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