Focus Control in Optical Lithography

Shiguang Li; Lei Guo; Haifeng Zeng; Yiyun Ji; Yin Wang; Yanqing Xiao

doi:10.3788/LOP202259.0922016

[1] Wei Y Y[M]. Advanced lithography theory and application of VLSI(2016).

[2] Liang Q J. Research of characters of maskless digital lithography based on 365 nm LED light source[D], 4-6(2017).

[3] Liu Z T. Research on PCB digital lithography projection optics design as well as scanning and its control technology[D], 1-3(2015).

[4] ASML. What’s next after EUV NXE? Reaching High-NA[EB/OL]. https://www.asml.com

[5] Zhong Z J. Impact of exposure system on focus control performance in advanced lithography[D], 22-33(2021).

[6] Jang J H, Park T, Park K D et al. Focus control budget analysis for critical layers of flash devices[J]. Proceedings of SPIE, 9050, 90502F(2014).

[7] Ausschnitt C P, Brunner T A. Distinguishing dose, focus, and blur for lithography characterization and control[J]. Proceedings of SPIE, 6520, 65200M(2007).

[8] Lee S H, Zhang Z Y. Process window study with various illuminations for EUV lithography applications[J]. Proceedings of SPIE, 6517, 65172P(2007).

[9] Ho G H, Cheng A, Chen C J et al. Lens heating-induced focus drift of I-line step and scan: correction and control in a manufacturing environment[J]. Proceedings of SPIE, 4344, 289-296(2001).

[10] Bakshi V[M]. EUV lithography, 627-631(2018).

[11] Zhong Z J, Li C Y, Li S G et al. Budget analysis of focus control in advanced lithography(I): optical path[J]. Chinese Optics, 14, 1104-1119(2021).

[12] Zhou G Z, He M F, Yang Z Y et al. Dual-beam laser direct writing nano-lithography system based on peripheral photoinhibition technology[J]. Chinese Journal of Lasers, 49, 0202001(2022).

[13] Chen L S, Qiao W, Ye Y et al. Critical technologies of micro-nano-manufacturing and its applications for flexible optoelectronic devices[J]. Acta Optica Sinica, 41, 0823018(2021).

[14] Suzuki A, Yabu S, Ookubo M. Intelligent optical system of a new stepper[J]. Proceedings of SPIE, 0772, 58-65(1987).

[15] Satoru O, Hideki I. Lithography apparatus, lithography method, and method of manufacturing article[P].

[16] Imai Y, Tanaka Y, Wakamoto S. Method of and apparatus for detecting plane position[P].

[17] Hagiwara T, Hamatani M, Tashiro H et al. Wafer edge-shot algorithm for wafer scanners[J]. Proceedings of SPIE, 4691, 790-801(2002).

[18] Hidaka Y, Nagayama T. Surface position detection apparatus, exposure apparatus, and exposure method[P].

[19] Goodwin E P, Smith D G. Interferometric level sensor[P].

[20] Simon R H, Marinus P R. Level sensor and lithographic apparatus[P].

[21] Jasper J C M, Loopstra E R, Modderman T M et al. Off-axis levelling in lithographic projection apparatus[P].

[22] Nelson M L, Kreuzer J L, Filosi P L et al. Method and system for improving focus accuracy in a lithography system[P].

[23] Liao C H, Wu M C. Lithography apparatus and method using the same[P].

[24] Ruud H M J B, Johan G C K, Joseph H L et al. Level sensor and lithographic apparatus incorporating a level sensor[P].

[25] Bruinsma A J A, Staals F, Wijk R J V et al. Level sensor, lithographic apparatus and device manufacturing method[P].

[26] Teunissen P A A, Broodbakker P J M, Queens R M G J. Level sensor for lithographic apparatus[P].

[27] Smith D G, Goodwin E P. Compensation for Goos-Hanchen error in autofocus systems[P].

[28] Sun Y W, Li S G, Ye T C et al. Process dependency of focusing and leveling measurement system in nanoscale lithography[J]. Acta Optica Sinica, 36, 0812001(2016).

[29] Lan K, Chen X Y, Liu X. Adaptability analysis of measurement technology of Groove Wafer focusing and leveling[J]. China Plant Engineering, 125-127(2021).