• Laser & Optoelectronics Progress
  • Vol. 59, Issue 9, 0922017 (2022)
Zhiping Zhang* and Xiaofeng Yang
Author Affiliations
  • Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement, Academy for Engineering and Technology, Fudan University, Shanghai , 201203, China
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    DOI: 10.3788/LOP202259.0922017 Cite this Article Set citation alerts
    Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017 Copy Citation Text show less
    Beat frequency diagram
    Fig. 1. Beat frequency diagram
    Schematic diagram of dual frequency laser interferometer
    Fig. 2. Schematic diagram of dual frequency laser interferometer
    Principle of grating measurement based on heterodyne interference
    Fig. 3. Principle of grating measurement based on heterodyne interference
    Multi-axis dual frequency laser interferometer in lithography machine[10]
    Fig. 4. Multi-axis dual frequency laser interferometer in lithography machine[10]
    Plane grating measurement scheme of ASML lithography machine[2,5,9]
    Fig. 5. Plane grating measurement scheme of ASML lithography machine[2,5,9]
    Hybrid measurement scheme of Nikon lithography machine [9]
    Fig. 6. Hybrid measurement scheme of Nikon lithography machine [9]
    ParameterHomodyne interferometryHeterodyne interferometry
    Fundamental frequencyfr-fm=0fr-fm=Δf
    Amplifier typeDC amplifierAC amplifier
    Disturbed by environmentMoreLess
    Disturbed by low frequencyYesNo
    Optics nonlinearityNoYes,1-2 nm
    Table 1. Comparison between homodyne interferometry and heterodyne interferometry
    ItemDescribe
    Instrument errorLaser wavelengthThe wavelength stability error of the laser is about 0.002×10-6
    ElectronicsIt mainly comes from the subdivision and counting errors of the signal processing card,usually in 1-2 resolutions
    Optics nonlinearityIt is mainly caused by the aliasing of two frequencies,usually within 2 nm
    Installation errorAbbe errorIt is caused by the rotation or yaw angle of the measured object when the measured point does not coincide with the target point
    Cosine errorThe error is caused by the included angle(cosine angle)between the measured optical axis and the motion axis. It is directly proportional to the measurement range
    Mirror mapThe measurement error is caused by the uneven surface morphology of the measured mirror. It can be compensated by the measurement and calibration algorithm
    Environmental errorAtmospheric compensationThe change of environmental parameters(temperature,pressure,humidity,etc.)leads to the change of wavelength on the measurement optical path,which leads to the measurement error
    Optics thermal driftThe error is caused by the volume change of optical components in the interferometer caused by temperature change. It can usually be controlled at 40 nm·℃-1
    Material thermal expansionThe error is caused by the thermal expansion and cold contraction of mechanical parts between the interferometer and the measured object due to temperature change
    Table 2. System error of dual frequency laser interferometer
    ItemDual frequency laser interferometerGrating measurement system based on heterodyne interference
    CommonBoth are based on Doppler frequency shift and heterodyne interferometry
    Difference
    The measured object is mirrorThe measured object is grating
    The moving direction of the measured object is parallel to the optical axisThe moving direction of the measured object is perpendicular to the optical axis
    The displacement measurement reference is the laser wavelengthThe displacement measurement reference is the grating spacing
    Large range measurement is greatly affected by the environmentThe distance is fixed,the optical path is symmetrical,and is less affected by the environment
    Low cost at large range measurementHigh cost at large range measurement
    Table 3. Dual frequency laser interferometer versus gratingmeasurement system
    Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017
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