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    Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922017 > Article
    • Laser & Optoelectronics Progress
    • Vol. 59, Issue 9, 0922017 (2022)
    Application of Laser Heterodyne Interference Technology in Lithography
    Zhiping Zhang* and Xiaofeng Yang
    Author Affiliations
  • Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement, Academy for Engineering and Technology, Fudan University, Shanghai , 201203, China
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    DOI: 10.3788/LOP202259.0922017 Cite this Article Set citation alerts
    Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017 Copy Citation Text show less
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    Article index updated: May. 31, 2024
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    The article is cited by 7 article(s) from Researching.
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    Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017
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    Paper Information
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