Measurement Techniques for Distortion of Lithography Projection Objective

Yisha Cao; Feng Tang; Xiangzhao Wang; Yang Liu; Peng Feng; Yunjun Lu; Fudong Guo

doi:10.3788/LOP202259.0922012

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922012 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922012 (2022)

Measurement Techniques for Distortion of Lithography Projection Objective

Yisha Cao^1、2, Feng Tang^1、2、*, Xiangzhao Wang^1、2, Yang Liu^1、2, Peng Feng¹, Yunjun Lu^1、2, and Fudong Guo¹

Author Affiliations

¹Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP202259.0922012 Cite this Article Set citation alerts

Yisha Cao, Feng Tang, Xiangzhao Wang, Yang Liu, Peng Feng, Yunjun Lu, Fudong Guo. Measurement Techniques for Distortion of Lithography Projection Objective[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922012 Copy Citation Text

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