• Infrared and Laser Engineering
  • Vol. 49, Issue 8, 20200204 (2020)
Yuqing Guan1, Dongmei Tang2, Yunxia Fu2, Jiayuan Sun2, Zhiguo Han3, Bo Zhang2, Ming Kong4, Chengming Cao2, and Lihua Lei1、*
Author Affiliations
  • 1College of Metrology and Measurement Engineering, China Jiliang University, Hangzhou 310018, China
  • 2Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
  • 3The 13th Research Institute of CETC, Shijiazhuang 050051, China
  • 4College of Metrology and Measurement Engineering, China Jiliang University, Hangzhou 310018, China
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    DOI: 10.3788/IRLA20200204 Cite this Article
    Yuqing Guan, Dongmei Tang, Yunxia Fu, Jiayuan Sun, Zhiguo Han, Bo Zhang, Ming Kong, Chengming Cao, Lihua Lei. Study on LM algorithm in Mueller''''s ellipsometry calibration method[J]. Infrared and Laser Engineering, 2020, 49(8): 20200204 Copy Citation Text show less

    Abstract

    According to the transmission method of polarized light in Mueller ellipsometry method, this paper presented a method for calibrating the optical element parameters in ellipsometry system. By establishing a nonlinear least squares model of outgoing light intensity with respect to orientations of transmission axis of the polarizer and analyzer and orientations and retardation of the rotation compensator, the initial parameters were iterated with Levenberg-Marquardt (LM) algorithm. Accurate values of optical element parameters could be obtained, so as to achieve the calibration of components. Through the simulation experiment, using the SiO2/Si standard sample with the known Mueller matrix and the calibration value of (24.90 ± 0.30) nm, the residual square sum of the light intensity value was calculated based on LM algorithm. When numbers of iterations accumulate to 50, the sum of squares converges of the residuals of the measurement and calculation was limited to 0.24. Then compared with the traditional multi-point calibration method, the feasibility of solving optical parameters based on LM algorithm was verified. Fitting results were validated by SiO2/Si standard sample with calibration value of (91.21±0.36) nm. Calculated film thickness was 91.53 nm and the relative error is 0.35%. Results proved that LM algorithm has advantages of rapidly converging and high precision in the parameter calibration of the Mueller ellipsometry system.
    Yuqing Guan, Dongmei Tang, Yunxia Fu, Jiayuan Sun, Zhiguo Han, Bo Zhang, Ming Kong, Chengming Cao, Lihua Lei. Study on LM algorithm in Mueller''''s ellipsometry calibration method[J]. Infrared and Laser Engineering, 2020, 49(8): 20200204
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