• High Power Laser Science and Engineering
  • Vol. 7, Issue 1, 010000e9 (2019)
Gang Xia1、2、3, Wei Fan1、2, Dajie Huang1、2, He Cheng1、2, Jiangtao Guo1、2、3, and Xiaoqin Wang1、2、3
Author Affiliations
  • 1Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    DOI: 10.1017/hpl.2018.69 Cite this Article Set citation alerts
    Gang Xia, Wei Fan, Dajie Huang, He Cheng, Jiangtao Guo, Xiaoqin Wang. High damage threshold liquid crystal binary mask for laser beam shaping[J]. High Power Laser Science and Engineering, 2019, 7(1): 010000e9 Copy Citation Text show less
    References

    [1] K. L. Marshall, O. Didovets, D. Saulnier. Proc. SPIE, 9182(2014).

    [2] J. Xie, W. Fan, X.-C. Li, Z.-Q. Lin. Acta Opt. Sin., 28, 1959(2008).

    [3] C. Dorrer. Opt. Lett., 34, 2330(2009).

    [4] K. L. Marshall, S. K.-H. Wei, M. Vargas, K. Wegman, C. Dorrer, P. Leung, J. Boule, Z. Zhao, S. H. Chen. Proc. SPIE, 8114(2011).

    [5] K. L. Marshall, C. Dorrer, M. Vargas, A. Gnolek, M. Statt, S.-H. Chen. Proc. SPIE, 8475(2012).

    [6] K. L. Marshall, J. Gan, G. Mitchell, S. Papernov, A. L. Rigatti, A. W. Schmid, S. D. Jacobs. Proc. SPIE, 7050(2008).

    [7] D.-J. Huang, W. Fan, X.-C. Li, Z.-Q. Lin. Chin. Opt. Lett., 11(2013).

    [8] D.-J. Huang, W. Fan, X.-C. Li, Z.-Q. Lin. Chin. Opt. Lett., 10(2012).

    [9] D.-J. Huang, W. Fan, X.-C. Li, Z.-Q. Lin. Proc. SPIE, 8556(2012).

    [10] D.-J. Huang, W. Fan, H. Chen, G. Xia, L.-L. Pei, X.-C. Li, Z.-Q. Lin. Proc. SPIE, 10457(2017).

    [11] K. L. Marshall, D. Saulnier, H. Xianyu, S. Serak, N. Tabiryan. Proc. SPIE, 8828(2013).

    [12] K. L. Marshall, E. R. Sekera, K. Xiao. Proc. SPIE, 9565(2015).

    [13] Y.-F. Ma, Z.-W. Fan, J.-S. Qiu, C.-Y. Feng, T.-Z. Zhao, W.-R. Lin. Chin. Opt. Lett., 8, 134(2010).

    [14] S.-S. Li, Y.-L. Wang, Z.-W. Lu, L. Ding, P.-Y. Du, Y. Chen, Z.-X. Zheng, D.-X. Ba, Y.-K. Dong, H. Yuan, Z.-X. Bai, Z.-H. Liu, C. Cui. Opt. Express, 23, 681(2015).

    [15] J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, J. DiNicola. Proc. SPIE, 7842(2010).

    [16] C. Dorrer, J. D. Zuegel. J. Opt. Soc. Am. B, 24, 1268(2007).

    [17] P. Rambo, J. Schwarz, M. Kimmel, J. L. Porter. High Power Laser Sci. Eng., 4, e32(2016).

    [18] C. Dorrer. Appl. Opt., 52, 3368(2013).

    [19] C. Dorrer, J. Hassett. Appl. Opt., 56, 806(2017).

    [20] Z.-Q. Lin, Y.-X. Zheng, W.-Y. Yu. Acta Phys. Sin., 28, 268(1979).

    [21] P. Chen, W. Ji, B.-Y. Wei, W. Hu, V. Chigrinov, Y.-Q. Lu. Appl. Phys. Lett., 107(2015).

    [22] P. Chen, S.-J. Ge, W. Duan, B.-Y. Wei, G.-X. Cui, W. Hu, Y.-Q. Lu. ACS Photon., 4, 1333(2017).

    [23] P. Chen, L.-L. Ma, W. Duan, J. Chen, S.-J. Ge, Z.-H. Zhu, M.-J. Tang, R. Xu, W. Gao, T. Li, W. Hu, Y.-Q. Lu. Adv. Mater., 30(2018).

    Gang Xia, Wei Fan, Dajie Huang, He Cheng, Jiangtao Guo, Xiaoqin Wang. High damage threshold liquid crystal binary mask for laser beam shaping[J]. High Power Laser Science and Engineering, 2019, 7(1): 010000e9
    Download Citation