High damage threshold liquid crystal binary mask for laser beam shaping

Gang Xia; Wei Fan; Dajie Huang; He Cheng; Jiangtao Guo; Xiaoqin Wang

doi:10.1017/hpl.2018.69

Journals >High Power Laser Science and Engineering >Volume 7 >Issue 1 >Page 010000e9 > Article

High Power Laser Science and Engineering
Vol. 7, Issue 1, 010000e9 (2019)

High damage threshold liquid crystal binary mask for laser beam shaping

Gang Xia^1、2、3, Wei Fan^1、2, Dajie Huang^1、2, He Cheng^1、2, Jiangtao Guo^1、2、3, and Xiaoqin Wang^1、2、3

Author Affiliations

¹Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.1017/hpl.2018.69 Cite this Article Set citation alerts

Gang Xia, Wei Fan, Dajie Huang, He Cheng, Jiangtao Guo, Xiaoqin Wang. High damage threshold liquid crystal binary mask for laser beam shaping[J]. High Power Laser Science and Engineering, 2019, 7(1): 010000e9 Copy Citation Text

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