In this study, self-organized nanoripples on photoresist surfaces are produced through low-energy ion bombardment (IB). Subsequently, the IB-induced photoresist nanoripples are considered as masks for fabricating subwavelength nanostructures on fused silica surfaces by reactive ion beam etching technique. Compared with pure-IB-induced fused silica nanoripples, the amplitude and aspect ratio of the proposed nanostructures increases significantly. The transmittance of the subwavelength nanostructured fused silica surfaces increases to approximately 94% for wavelengths from 600 nm to 1300 nm. Preliminary results reveal the potential of ion bombardment in the preparation of functional surface nanostructures.