• Opto-Electronic Science
  • Vol. 1, Issue 10, 220016 (2022)
Jung-Hong Min1, Kwangjae Lee2, Tae-Hoon Chung3, Jung-Wook Min1, Kuang-Hui Li1, Chun Hong Kang1, Hoe-Min Kwak4, Tae-Hyeon Kim5, Youyou Yuan6, Kyoung-Kook Kim5, Dong-Seon Lee4, Tien Khee Ng1, and Boon S. Ooi1、*
Author Affiliations
  • 1Photonics Laboratory, Computer, Electrical and Mathematical Sciences and Engineering Division (CEMSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
  • 2Department of Electrical Engineering, Stanford University, Stanford, CA 94305, USA
  • 3Light Source Research Division, Korea Photonics Technology Institute (KOPTI), Gwangju 61007, Republic of Korea
  • 4School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea
  • 5Department of Advanced Convergence Technology, Research Institute of Advanced Convergence Technology, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si 15073, Republic of Korea
  • 6King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
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    DOI: 10.29026/oes.2022.220016 Cite this Article
    Jung-Hong Min, Kwangjae Lee, Tae-Hoon Chung, Jung-Wook Min, Kuang-Hui Li, Chun Hong Kang, Hoe-Min Kwak, Tae-Hyeon Kim, Youyou Yuan, Kyoung-Kook Kim, Dong-Seon Lee, Tien Khee Ng, Boon S. Ooi. Large-scale and high-quality III-nitride membranes through microcavity-assisted crack propagation by engineering tensile-stressed Ni layers[J]. Opto-Electronic Science, 2022, 1(10): 220016 Copy Citation Text show less
    References
    Jung-Hong Min, Kwangjae Lee, Tae-Hoon Chung, Jung-Wook Min, Kuang-Hui Li, Chun Hong Kang, Hoe-Min Kwak, Tae-Hyeon Kim, Youyou Yuan, Kyoung-Kook Kim, Dong-Seon Lee, Tien Khee Ng, Boon S. Ooi. Large-scale and high-quality III-nitride membranes through microcavity-assisted crack propagation by engineering tensile-stressed Ni layers[J]. Opto-Electronic Science, 2022, 1(10): 220016
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