Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001
- Acta Optica Sinica
- Vol. 37, Issue 10, 1022001 (2017)
Fig. 1. Schematic diagram of lithography imaging system
Fig. 2. Schematic of (a) source encoding and (b) mask encoding
Fig. 3. Projector pupil phase distribution. (a) z4; (b) z9; (c) z16; (d) z25; (e) z36; (f) fitting projector pupil
Fig. 4. Flowcharts of SMPO method using PSO algorithm. (a) General flowchart; (b) sub-flowcharts
Fig. 5. (a) Initial source; (b) initial mask; (c) initial projector pupil; (d) initial photoresist image in nominal condition
Fig. 6. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in nominal condition
Fig. 7. Convergence curve in nominal condition
Fig. 8. (a) Initial projector pupil; (b) initial photoresist image in process condition
Fig. 9. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in process condition
Fig. 10. Convergence curve in process condition
Fig. 11. Optimal results of SMO method based on PSO algorithm. (a) Optimized source; (b) optimized mask; (c) optimized photoresist image; (d) convergence curve
Fig. 12. Optimal results without data compression of the mask pattern. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized resist image
Fig. 13. Optimal results of SMPO method based on genetic algorithm. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image
Fig. 14. Convergence curves of SMPO methods based on GA and PSO algorithm
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