Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Lei Wang; Sikun Li; Xiangzhao Wang; Chaoxing Yang

doi:10.3788/AOS201737.1022001

Journals >Acta Optica Sinica >Volume 37 >Issue 10 >Page 1022001 > Article

Acta Optica Sinica
Vol. 37, Issue 10, 1022001 (2017)

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Lei Wang^1、2, Sikun Li^1、2, Xiangzhao Wang^1、2、*, and Chaoxing Yang¹

Author Affiliations

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/AOS201737.1022001 Cite this Article Set citation alerts

Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001 Copy Citation Text

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