Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target

Boyang Wei; Dongmei Liu; Xiuhua Fu; Jing Zhang; Yang Wang; Yu Geng

doi:10.3788/AOS202141.0731001

Journals >Acta Optica Sinica >Volume 41 >Issue 7 >Page 0731001 > Article

Acta Optica Sinica
Vol. 41, Issue 7, 0731001 (2021)

Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target

Boyang Wei^1、*, Dongmei Liu¹, Xiuhua Fu¹, Jing Zhang¹, Yang Wang², and Yu Geng²

Author Affiliations

¹School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China

²Optorun (Shanghai) Co., Ltd., Shanghai 200444, China

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DOI: 10.3788/AOS202141.0731001 Cite this Article Set citation alerts

Boyang Wei, Dongmei Liu, Xiuhua Fu, Jing Zhang, Yang Wang, Yu Geng. Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target[J]. Acta Optica Sinica, 2021, 41(7): 0731001 Copy Citation Text

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Boyang Wei, Dongmei Liu, Xiuhua Fu, Jing Zhang, Yang Wang, Yu Geng. Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target[J]. Acta Optica Sinica, 2021, 41(7): 0731001

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