• Laser & Optoelectronics Progress
  • Vol. 59, Issue 9, 0922011 (2022)
Jiahong Liu1、2, Fang Zhang1、*, and Huijie Huang1、2、**
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049
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    DOI: 10.3788/LOP202259.0922011 Cite this Article Set citation alerts
    Jiahong Liu, Fang Zhang, Huijie Huang. Research Progress on Illumination System Technology of Step-and-Scan Projection Lithography Tools[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922011 Copy Citation Text show less
    Schematic of illumination system of step-and-scan lithography tools
    Fig. 1. Schematic of illumination system of step-and-scan lithography tools
    Diagram of illumination mode development state[19]
    Fig. 2. Diagram of illumination mode development state[19]
    Schematic of different illumination modes by zoom Fourier transform lens group and axicon lens group[21]
    Fig. 3. Schematic of different illumination modes by zoom Fourier transform lens group and axicon lens group[21]
    Schematic of pupil shaping based on micro-mirror array[25]
    Fig. 4. Schematic of pupil shaping based on micro-mirror array[25]
    Schematic of pupil compensation technology. (a) Schematic of filter[26]; (b) schematic of compensating finger[27]
    Fig. 5. Schematic of pupil compensation technology. (a) Schematic of filter[26]; (b) schematic of compensating finger[27]
    Schematic of intensity distribution of top-Gaussian illumination optical field[29]
    Fig. 6. Schematic of intensity distribution of top-Gaussian illumination optical field[29]
    Schematic of homogenizing principle of integrator rod
    Fig. 7. Schematic of homogenizing principle of integrator rod
    Schematic of working principle of illumination homogenization unit with MLAs[32]
    Fig. 8. Schematic of working principle of illumination homogenization unit with MLAs[32]
    Schematic of finger array uniformity corrector[39]
    Fig. 9. Schematic of finger array uniformity corrector[39]
    Schematic of generally used polarized illumination modes under traditional illumination mode[41]
    Fig. 10. Schematic of generally used polarized illumination modes under traditional illumination mode[41]
    Jiahong Liu, Fang Zhang, Huijie Huang. Research Progress on Illumination System Technology of Step-and-Scan Projection Lithography Tools[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922011
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