Absorption measurement of optical thin films under high power density with a Closed Cavity

Xiaoting Fang; Shengfu Yuan; Wenguang Liu; Baozhu Yan; Bing Huang

doi:10.3788/COL201513.033101

Journals >Chinese Optics Letters >Volume 13 >Issue 3 >Page 033101 > Article

Chinese Optics Letters
Vol. 13, Issue 3, 033101 (2015)

Absorption measurement of optical thin films under high power density with a Closed Cavity

Xiaoting Fang, Shengfu Yuan^*, Wenguang Liu, Baozhu Yan, and Bing Huang

Author Affiliations

College of Optoelectric Science and Engineering, National University of Defence Technology, Changsha 410073, China

show less

DOI: 10.3788/COL201513.033101 Cite this Article Set citation alerts

Xiaoting Fang, Shengfu Yuan, Wenguang Liu, Baozhu Yan, Bing Huang. Absorption measurement of optical thin films under high power density with a Closed Cavity[J]. Chinese Optics Letters, 2015, 13(3): 033101 Copy Citation Text

EndNote(RIS)

BibTex

Plain Text

show less

Abstract

A Closed Cavity measuring platform is built on the basis of a 1000 W-class direct current (DC)-discharge drived continuous-wave (CW) HF/DF chemical laser. On this platform, the absorption coefficients of optical thin films coated on the surfaces of monocrystalline silicon substrates, at the wavelength of 3.6–4.1 μm, is measured, when the power density on the surfaces of optical thin films reaches about

3.16 kW / {cm}^{2}

. The measuring principle and structure of the Closed Cavity is introduced. The temperature curves and balanced temperature rises of the film-substrate systems under test measured through the experiment is presented in this Letter. The experiments show high reliability, good repeatability and strong practicality. The Closed Cavity measuring platform is applicable for not only absorption measurement but other performance measurement of optical thin films under high power density.