Author Affiliations
1Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China2SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, Guangzhou 510006, China3Guangdong Provincial Key Laboratory of Nanophotonic Functional Materials and Devices, School of Information and Optoelectronic Science and Engineering, South China Normal University, Guangzhou 510006, China4Joint Laboratory of Optofluidic Technology and Systems, National Center for International Research on Green Optoelectronics, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China5College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210046, China6Key Laboratory of Radio Frequency and Micro-Nano Electronics of Jiangsu Province, Nanjing 210023, China7e-mail: shuill@m.scnu.edu.cnshow less
Fig. 1. (a) Schematic diagram of electrically stimulated LC photonic device. (b), (c) Grids of patterned electrode meshing in similar number of model grids. (b) Uniform grids and (c) nonuniform grids. The scale bars in (b), (c) are 10 μm.
Fig. 2. (a) Schematic diagram of calculation relation. (b) Calculation sequence of SOR. (c), (d) Schematic diagram of (c) periodic and (d) symmetric boundary conditions. (e) Boundary conditions at different p values.
Fig. 3. (a) Schematic illustration of the unit cell of the LC photonic device. (b)–(j) Slice diagrams of the calculated tilt angle of the directors. (b)–(d) FEM, (e)–(g) uniform FDM, and (h)–(j) nonuniform FDM. (b), (e), (h) Along x direction where x is sampled at 50, 55, 60, 65, 70, 75, 80, and 85 μm. (c), (f), (i) Along z direction where z is sampled at 30, 35, 40, 45, and 49.5 μm. (d), (g), (j) Zoomed-in image of tilt angle diagrams of the directors.
Fig. 4. Comparison of mesh grid distribution between nonuniform and uniform methods. (a)–(c) Grid of nonuniform method (a) in xz plane, (b) in xy plane, and (c) inside the LC layer in xz plane. (d), (e) Grid size comparison between the uniform and nonuniform methods. (d) Along x or y direction. (e) Along z direction.
Fig. 5. (a) Schematic illustration of the experimental setup to characterize the LC devices. (b), (f) Experimentally recorded light field intensity distributions at the LC layer surface of (b) array and (f) one unit. (c), (d), (e) Light field simulation results of the LC layer in the transverse plane with (c) FEM, (d) uniform FDM, and (e) nonuniform FDM. (g) Light field intensity distribution of the outermost ring of the LC layer surface in polar coordinate. (h) Simulated light field intensity distribution along the longitudinal plane. (i) Experimentally recorded light field intensity distribution along the longitudinal plane. The scale bar in (b) is 50 μm; the scale bars in (c)–(f) are 10 μm.
Methods | Minimum Element Size (μm) | Number of Domain Elements (LC Region) | Computational Resources (Gb) | Number of Iterations | Simulation Time (min) | Total Energy (J) |
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FEM (COMSOL) | 1 | 105,847 | 13.6 | 11 | 53.3 | | Uniform FDM | | 2,198,016 | 3.1 | 1253 | 7.4 | | Nonuniform FDM | | 2,164,032 | 3.1 | 1551 | 10.2 | | Uniform FDM (fine) | | 18,063,360 | 4.2 | 1955 | 45.1 | |
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Table 1. Calculation Information of Three Methods