• Infrared and Laser Engineering
  • Vol. 50, Issue 8, 20210357 (2021)
Jinhui Wu1, Xiulan Ling2, Ji Liu1、2, and Xin Chen2
Author Affiliations
  • 1Ministry of Education and Key Laboratory of Science and Technology on Electronic Test & Measurement, Key Laboratory of Instrumentation Science & Dynamic Measurement,North University of China, Taiyuan 030051, China
  • 2School of Information and Communication Engineering, North University of China, Taiyuan 030051, China
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    DOI: 10.3788/IRLA20210357 Cite this Article
    Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357 Copy Citation Text show less
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    [9] S Papernov, A W Schmid. Testing asymmetry in plasma-ball growth seeded by a nanoscale absorbing defect embedded in a SiO2 thin-film matrix subjected to UV pulsed-laser radiation. Journal of Applied Physics, 104, 063101(2008).

    [10] S Papernova, A W Schmid. Two mechanisms of crater formation in ultraviolet-pulsed-laser irradiated SiO2 thin films with artificial defects. Journal of Applied Physics, 97, 114906(2005).

    [11] C W Carr, H B Radousky, A M Rubenchik, et al. Localized dynamics during laser-induced damage in optical materials. Physical Review Letters, 92, 087401(2004).

    [12] S Papernova, A W Schmid. Correlations between embedded single gold nanoparticles in SiO2 thin film and nanoscale crater formation induced by pulsed-laser radiation. Journal of Applied Physics, 92, 5720-5728(2002).

    [13] Z L Xia, Z X Fan, J D Shao. Statistical approach to bulk inclusion initialized damage in films. Optics Communications, 265, 620-627(2006).

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    Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357
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