Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu; Xiulan Ling; Ji Liu; Xin Chen

doi:10.3788/IRLA20210357

Journals >Infrared and Laser Engineering >Volume 50 >Issue 8 >Page 20210357 > Article

Infrared and Laser Engineering
Vol. 50, Issue 8, 20210357 (2021)

Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu¹, Xiulan Ling², Ji Liu^1、2, and Xin Chen²

Author Affiliations

¹Ministry of Education and Key Laboratory of Science and Technology on Electronic Test & Measurement, Key Laboratory of Instrumentation Science & Dynamic Measurement,North University of China, Taiyuan 030051, China

²School of Information and Communication Engineering, North University of China, Taiyuan 030051, China

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DOI: 10.3788/IRLA20210357 Cite this Article

Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357 Copy Citation Text

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Abstract

Keywords

defect laser-induced damage light field enhancement optical thin film

$\begin{split} \\ I=\frac{1}{2}\sqrt{{}^{{{\varepsilon }_{0}}}\!\!\diagup\!\!{}_{{{\mu }_{0}}}\;}{{n}_{i}}{{\left| E \right|}^{2}} \end{split}$

(1)

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$ Q=\iiint \alpha I{\rm{d}}v $

(2)

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Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357

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