High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography

Yi Yin; Zhijian Liu; Saijie Wang; Sen Wu; Zhijun Yan; Xinxiang Pan

doi:10.3788/LOP57.032202

Journals >Laser & Optoelectronics Progress >Volume 57 >Issue 3 >Page 032202 > Article

Laser & Optoelectronics Progress
Vol. 57, Issue 3, 032202 (2020)

High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography

Yi Yin¹, Zhijian Liu^1、*, Saijie Wang¹, Sen Wu¹, Zhijun Yan¹, and Xinxiang Pan²

Author Affiliations

¹Marine Engineering College of Dalian Maritime University, Dalian, Liaoning 116026, China

²College of Ocean Engineering, Guangdong Ocean University, Zhanjiang, Guangdong 524088, China

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DOI: 10.3788/LOP57.032202 Cite this Article Set citation alerts

Yi Yin, Zhijian Liu, Saijie Wang, Sen Wu, Zhijun Yan, Xinxiang Pan. High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography[J]. Laser & Optoelectronics Progress, 2020, 57(3): 032202 Copy Citation Text

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