• Laser & Optoelectronics Progress
  • Vol. 59, Issue 5, 0523003 (2022)
Jing Zhang1, Wenrui Xue1、*, Chen Zhang1, Yuting Chen1, and Changyong Li2、3
Author Affiliations
  • 1College of Physics and Electronic Engineering, Shanxi University, Taiyuan , Shanxi 030006, China
  • 2Key Laboratory of Quantum Optics and Photonic Devices, Institute of Laser Spectroscopy, Shanxi University, Taiyuan , Shanxi 030006, China
  • 3Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan , Shanxi 030006, China
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    DOI: 10.3788/LOP202259.0523003 Cite this Article Set citation alerts
    Jing Zhang, Wenrui Xue, Chen Zhang, Yuting Chen, Changyong Li. Grating-Type Ultraviolet Absorber Based on Bi1.5Sb0.5Te1.8Se1.2 Materials[J]. Laser & Optoelectronics Progress, 2022, 59(5): 0523003 Copy Citation Text show less

    Abstract

    Based on Bi1.5Sb0.5Te1.8Se1.2 material, a grating-type ultraviolet absorber was designed. Using the finite element method, the dependence of the absorption characteristics of the absorber on structural parameters, incident angle and working wavelength was analyzed in detail. The absorption mechanism of the absorber is the magnetic polariton resonance effect. By adjusting the structural parameters, incident angle and working wavelength, the absorption characteristics of the absorber can be adjusted. With optimized parameters, the absorption rate can reach more than 80% in the wavelength range of 200~400 nm and the incident angle range of 0~75°. The work in this paper provides a theoretical basis for the design and manufacture of ultraviolet absorbers and their applications in ultraviolet detection and protection, biosensing, and ultraviolet photocatalysis.
    Jing Zhang, Wenrui Xue, Chen Zhang, Yuting Chen, Changyong Li. Grating-Type Ultraviolet Absorber Based on Bi1.5Sb0.5Te1.8Se1.2 Materials[J]. Laser & Optoelectronics Progress, 2022, 59(5): 0523003
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