• Acta Optica Sinica
  • Vol. 37, Issue 12, 1231001 (2017)
Wenjia Yuan, Weidong Shen*, Xiaowen Zheng, Chenying Yang, Yueguang Zhang, Bo Fang, Wen Mu, Chaonan Chen, and Xu Liu
Author Affiliations
  • State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China
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    DOI: 10.3788/AOS201737.1231001 Cite this Article Set citation alerts
    Wenjia Yuan, Weidong Shen, Xiaowen Zheng, Chenying Yang, Yueguang Zhang, Bo Fang, Wen Mu, Chaonan Chen, Xu Liu. Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(12): 1231001 Copy Citation Text show less
    Structural diagram of DIBS system
    Fig. 1. Structural diagram of DIBS system
    Transmission curves of Ta2O5 films prepared under different assisted ion source voltages
    Fig. 2. Transmission curves of Ta2O5 films prepared under different assisted ion source voltages
    Optical constants of different thin films prepared by different methods of EBE, IBAD and IBS when wavelength is 550 nm.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Fig. 3. Optical constants of different thin films prepared by different methods of EBE, IBAD and IBS when wavelength is 550 nm.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Stress value of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Fig. 4. Stress value of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Hardness of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Fig. 5. Hardness of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Young modulus of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Fig. 6. Young modulus of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
    Surface morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD, (c) SIBS and (d) DIBS
    Fig. 7. Surface morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD, (c) SIBS and (d) DIBS
    Cross-sectional morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD and (c) DIBS
    Fig. 8. Cross-sectional morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD and (c) DIBS
    MaterialSputtering ion source parameterAssisted ion source parameterBackground pressure /(10-4 Pa)Working pressure /(10-2 Pa)
    Beam current /mABeam voltage /VGas flow /(mL·min-1)Beam current /mABeam voltage /VGas flow /(mL·min-1)
    Nb2O5400100016(Ar)100200-8006(Ar), 18(O2)1.05.0
    Ta2O5400100016(Ar)100200-6006(Ar), 18(O2)1.05.0
    SiO2400100016(Ar)100200-6006(Ar), 18(O2)1.05.1
    Table 1. Process parameters of IBS deposition
    MaterialTemperature /℃Working pressure /(10-2 Pa)Deposition rate /(nm·s-1)
    EBEIBADEBEIBADEBEIBAD
    Nb2O52302002.02.00.30.3
    Ta2O52302002.02.00.30.3
    SiO22302000.31.30.80.8
    Table 2. Process parameters of EBE and IBAD
    Wenjia Yuan, Weidong Shen, Xiaowen Zheng, Chenying Yang, Yueguang Zhang, Bo Fang, Wen Mu, Chaonan Chen, Xu Liu. Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(12): 1231001
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