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    Journals >Acta Optica Sinica >Volume 37 >Issue 4 >Page 412003 > Article
    • Acta Optica Sinica
    • Vol. 37, Issue 4, 412003 (2017)
    High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens
    Zhu Boer1、2、*, Wang Xiangzhao1、2, Li Sikun1、2, Meng Zejiang1、2, Zhang Heng1、2, Dai Fengzhao1、2, and Duan Lifeng3
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201737.0412003 Cite this Article Set citation alerts
    Zhu Boer, Wang Xiangzhao, Li Sikun, Meng Zejiang, Zhang Heng, Dai Fengzhao, Duan Lifeng. High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens[J]. Acta Optica Sinica, 2017, 37(4): 412003 Copy Citation Text show less
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    Article index updated: May. 19, 2024
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    Zhu Boer, Wang Xiangzhao, Li Sikun, Meng Zejiang, Zhang Heng, Dai Fengzhao, Duan Lifeng. High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens[J]. Acta Optica Sinica, 2017, 37(4): 412003
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