A high-order aberration measurement method for hyper-NA lithographic projection lens based on a test target with eight angles is proposed. A linear model between aerial image intensity distribution of the hyper-NA lithographic projection lens and high-order aberrations is built by principal component analysis (PCA) and multivariate linear regression analysis for binary target with eight angles of aerial image. And the high-order aberration measurement is achieved based on the proposed model. Compared with the binary target with six angles in the conventional method, the proposed method improves the efficiency of pupil wavefront sampling, expands the measuring range of the wavefront aberrations, and achieves the high precision measurement of high-order aberrations(Z5~Z64) of the hyper-NA lithographic projection lens. Simulations with the lithographic simulator PROLITH show that the proposed method can realize the measurement for 60 terms of Zernike coefficients (Z5~Z64) with measurement accuracy better than 1.03×10-3λ.