[1] Wang X Z, Dai F Z, Li S K et al[M]. Integrated circuit and lithographic tool(2020).

[2] Wang X Z, Dai F Z[M]. Image quality measurement techniques for lithographic tools (volume Ⅰ)(2021).

[3] Wang X Z, Dai F Z[M]. Image quality measurement techniques for lithographic tools (volume Ⅱ)(2021).

[4] Li S K, Wang X Z, Bu Y. Robust pixel-based source and mask optimization for inverse lithography[J]. Optics & Laser Technology, 45, 285-293(2013).

[5] Yang C X. Study on source mask optimization based on genetic algorithm for lithograhpy[D](2016).

[6] Yang C X, Wang X Z, Li S K et al. Source mask optimization using real-coded genetic algorithms[J]. Proceedings of SPIE, 8683, 86831T(2013).

[7] Yang C X, Li S K, Wang X Z. Efficient source mask optimization using multipole source representation[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 13, 043001(2014).

[8] Yan G Y. Study on source mask optimization and aberration measurement techniques for lithography tools[D](2015).

[9] Yan G Y, Li S K, Wang X Z. Source optimization method of lithography tools based on quadratic programming[J]. Acta Optica Sinica, 34, 1022004(2014).

[10] Li Z Z. Source and mask optimization using stochastic parallel gradient descent algorithm in optical lithography[D](2014).

[11] Li Z Z, Li S K, Wang X Z. Source and mask optimization using stochastic parallel gradient descent algorithm in optical lithography[J]. Acta Optica Sinica, 34, 0911002(2014).

[12] Wang L, Li S K, Wang X Z et al. Source optimization using particle swarm optimization algorithm in photolithography[J]. Proceedings of SPIE, 9426, 94261L(2015).

[13] Wang L, Li S K, Wang X Z et al. Pixelated source optimization for optical lithography via particle swarm optimization[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15, 013506(2016).

[14] Wang L, Li S K, Wang X Z et al. Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography[J]. Proceedings of SPIE, 9780, 97801V(2016).

[15] Wang L. Source mask projector optimization using particle swarm optimization algorithm in optical lithography[D](2017).

[16] Wang L, Li S K, Wang X Z et al. Source mask projector optimization method of lithography tools based on particle swarm optimization algorithm[J]. Acta Optica Sinica, 37, 1022001(2017).

[17] Yang C X, Li S K, Wang X Z. Source mask optimization based on dynamic fitness function[J]. Acta Optica Sinica, 36, 0111006(2016).

[18] Yang C X, Li S K, Wang X Z. Pixelated source mask optimization based on multi chromosome genetic algorithm[J]. Acta Optica Sinica, 36, 0811001(2016).

[19] Liao L F, Li S K, Wang X Z et al. Critical pattern selection method for full-chip source and mask optimization[J]. Optics Express, 28, 20748-20763(2020).

[20] Chen G D, Li S K, Wang X Z. Source mask optimization using the covariance matrix adaptation evolution strategy[J]. Optics Express, 28, 33371-33389(2020).

[21] Chen G D. Study on computational lithography techniques for deep ultraviolet lithography[D](2021).

[22] Liao L F, Li S K, Wang X Z et al. Critical pattern selection based on diffraction spectrum analysis for full-chip source mask optimization[J]. Acta Optica Sinica, 40, 2122001(2020).

[23] Zhang Z N, Li S K, Wang X Z et al. Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling[J]. Optics Express, 29, 22778-22795(2021).

[24] Zhang Z N, Li S K, Wang X Z et al. Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm[J]. Optics Express, 29, 5448-5465(2021).

[25] Yang X H, Li S K, Liao L F et al. Critical pattern selection method based on depth-first search for full-chip source and mask optimization[J]. Acta Optica Sinica, 42, 1022002(2022).

[26] Rosenbluth A E, Bukofsky S J, Hibbs M S et al. Optimum mask and source patterns to print a given shape[J]. Proceedings of SPIE, 4346, 486-502(2001).

[27] Hsu S, Li Z P, Chen L Q et al. Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance[J]. Proceedings of SPIE, 7520, 75200D(2009).

[28] Lai K, Rosenbluth A E, Bagheri S et al. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22 nm logic lithography process[J]. Proceedings of SPIE, 7274, 72740A(2009).

[29] Tian K H, Fakhry M, Dave A et al. Applicability of global source mask optimization to 22/20 nm node and beyond[J]. Proceedings of SPIE, 7973, 79730C(2011).

[30] Lai K, Gabrani M, Demaris D et al. Design specific joint optimization of masks and sources on a very large scale[J]. Proceedings of SPIE, 7973, 797308(2011).

[31] Socha R, Shi X L, LeHoty D. Simultaneous source mask optimization (SMO)[J]. Proceedings of SPIE, 180-193(2005).

[32] Hsu S, Chen L Q, Li Z P et al. An innovative source-mask co-optimization (SMO) method for extending low k1 imaging[J]. Proceedings of SPIE, 7140, 714010(2008).

[33] Bekaert J, Laenens B, Verhaegen S et al. Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells[J]. Proceedings of SPIE, 7640, 764008(2010).

[34] de Bisschop P, Laenens B, Iwase K et al. Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i[J]. Proceedings of SPIE, 7973, 79730B(2011).

[35] Socha R, Jhaveri T, Dusa M et al. Design compliant source mask optimization (SMO)[J]. Proceedings of SPIE, 7748, 77480T(2010).

[36] Liu X F, Howell R, Hsu S et al. EUV source-mask optimization for 7 nm node and beyond[J]. Proceedings of SPIE, 9048, 90480Q(2014).

[37] Kim H C, Nam D S, Hwang C et al. Layer-specific illumination optimization by Monte Carlo method[J]. Proceedings of SPIE, 5040, 244-250(2003).

[38] Granik Y. Source optimization for image fidelity and throughput[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 3, 509-522(2004).

[39] Granik Y. Solving inverse problems of optical microlithography[J]. Proceedings of SPIE, 5754, 506-526(2005).

[40] Granik Y. Fast pixel-based mask optimization for inverse lithography[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 5, 043002(2006).

[41] Mülders T, Domnenko V, Küchler B et al. Simultaneous source-mask optimization: a numerical combining method[J]. Proceedings of SPIE, 7823, 78233X(2010).

[42] Gao W M, Sethi S, Domnenko V et al. Point-source approach of source-mask optimization[J]. Proceedings of SPIE, 7748, 77480U(2010).

[43] Pang L Y, Xiao G M, Tolani V et al. Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)[J]. Proceedings of SPIE, 7122, 71221W(2008).

[44] Torunoglu I, Elsen E, Karakas A. A GPU-based full-chip source-mask optimization solution[J]. Proceedings of SPIE, 7640, 76401L(2010).

[45] Flagello D, Matsui R, Yano K et al. The development of a fast physical photoresist model for OPE and SMO applications from an optical engineering perspective[J]. Proceedings of SPIE, 8326, 83260R(2012).

[46] Hashimoto T, Kai Y, Masukawa K et al. Robust SMO methodology for exposure tool and mask variations in high volume production[J]. Proceedings of SPIE, 8683, 868309(2013).

[47] Fühner T, Erdmann A. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm[J]. Proceedings of SPIE, 5754, 415-426(2005).

[48] Fühner T, Erdmann A, Evanschitzky P. Simulation-based EUV source and mask optimization[J]. Proceedings of SPIE, 7122, 71221Y(2008).

[49] Fühner T, Evanschitzky P, Erdmann A. Mutual source, mask and projector pupil optimization[J]. Proceedings of SPIE, 8326, 83260I(2012).

[50] Ma X, Arce G R. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography[J]. Optics Express, 17, 5783-5793(2009).

[51] Jia N N, Lam E Y. Pixelated source mask optimization for process robustness in optical lithography[J]. Optics Express, 19, 19384-19398(2011).

[52] Yu J C, Yu P C. Gradient-based fast source mask optimization (SMO)[J]. Proceedings of SPIE, 797320(2011).

[53] Peng Y, Zhang J Y, Wang Y et al. Gradient-based source and mask optimization in optical lithography[J]. IEEE Transactions on Image Processing, 20, 2856-2864(2011).

[54] Chang J H C, Chen C C P, Melvin I L S. Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA[J]. Proceedings of SPIE, 7640, 764026(2010).

[55] Li J, Liu S Y, Lam E Y. Efficient source and mask optimization with augmented Lagrangian methods in optical lithography[J]. Optics Express, 21, 8076-8090(2013).

[56] Wu X F, Liu S Y, Li J et al. Efficient source mask optimization with Zernike polynomial functions for source representation[J]. Optics Express, 22, 3924-3937(2014).

[57] Ma X, Li Y Q, Guo X J et al. Robust resolution enhancement optimization methods to process variations based on vector imaging model[J]. Proceedings of SPIE, 8326, 83262A(2012).

[58] Han C Y, Li Y Q, Ma X et al. Robust hybrid source and mask optimization to lithography source blur and flare[J]. Applied Optics, 54, 5291-5302(2015).

[59] Sears M K, Fenger G, Mailfert J et al. Extending SMO into the lens pupil domain[J]. Proceedings of SPIE, 7973, 79731B(2011).

[60] Li J, Lam E Y. Robust source and mask optimization compensating for mask topography effects in computational lithography[J]. Optics Express, 22, 9471-9485(2014).

[61] Tsai M C, Hsu S, Chen L Q et al. Full-chip source and mask optimization[J]. Proceedings of SPIE, 7973, 79730A(2011).

[62] Zhang D Q, Chua G, Foong Y et al. Source mask optimization methodology (SMO) and application to real full chip optical proximity correction[J]. Proceedings of SPIE, 8326, 83261V(2012).

[63] Pei J, Shao F, ElSewefy O et al. Compatibility of optimized source over design changes in the foundry environment[J]. Proceedings of SPIE, 8683, 86831M(2013).

[64] Melville D, Rosenbluth A E, Tian K H et al. Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations[J]. Proceedings of SPIE, 7640, 764006(2010).

[65] Lin B J[M]. Optical lithography: here is why(2010).

[66] Poonawala A, Stanton W, Sawh C. Source mask optimization for advanced lithography nodes[J]. Proceedings of SPIE, 7640, 76401M(2010).

[67] Kojima Y, Moniwa A, Maruyama T et al. Novel OPC flow for the trim-mask lithography[J]. Proceedings of SPIE, 8441, 84410I(2012).

[68] Wong A K[M]. Resolution enhancement techniques in optical lithography(2001).