• Acta Optica Sinica
  • Vol. 42, Issue 8, 0800002 (2022)
Fan Li1、2, Le Kang1、2、*, Fugui Yang1, Chunxia Yao1, Peiping Zhu1, Ming Li1, and Weifan Sheng1
Author Affiliations
  • 1Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
  • 2Spallation Neutron Source Science Center, Dongguan, Guangdong 523803, China
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    DOI: 10.3788/AOS202242.0800002 Cite this Article Set citation alerts
    Fan Li, Le Kang, Fugui Yang, Chunxia Yao, Peiping Zhu, Ming Li, Weifan Sheng. Present Research Status of X-Ray Near-Field Speckle Based Wavefront Metrology[J]. Acta Optica Sinica, 2022, 42(8): 0800002 Copy Citation Text show less

    Abstract

    The fourth generation synchrotron radiation light source provides X-rays with higher brightness and coherence,and better performance for many research fields. To access the full potential of these beams, accurate beamline alignment and high-quality X-ray optics are required. Wavefront metrology plays an important role in these aspects. X-ray near-field speckle based wavefront metrology, which has been developed rapidly in the past 10 years, has the advantages of simplicity and high measurement accuracy. Based on the property of not changing in shape and size of the speckle in the deep Fresnel region, the cross-correlation between the reference image and the sample image is calculated, and the wavefront information of the incident wave, the transmitted wave or the reflected wave of the optics to be measured is extracted. The present research status of X-ray near-field speckle based wavefront metrology is summarized. The principles, experimental procedures, advantages and applications of X-ray speckle tracking, X-ray speckle vector tracking, X-ray speckle scanning, self-correlation X-ray speckle scanning, unified modulated pattern analysis and Ptychographic X-ray speckle tracking are introduced.
    Fan Li, Le Kang, Fugui Yang, Chunxia Yao, Peiping Zhu, Ming Li, Weifan Sheng. Present Research Status of X-Ray Near-Field Speckle Based Wavefront Metrology[J]. Acta Optica Sinica, 2022, 42(8): 0800002
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