Annular Plasma Photonic Crystals with Different Filling Ratios in Dielectric Barrier Discharge

Yining Liu; Weili Fan; Xiaohan Hou; Zhicheng Wu; Yafeng He; Fucheng Liu

doi:10.3788/LOP202259.1323002

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 13 >Page 1323002 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 13, 1323002 (2022)

Annular Plasma Photonic Crystals with Different Filling Ratios in Dielectric Barrier Discharge

Yining Liu, Weili Fan^*, Xiaohan Hou, Zhicheng Wu, Yafeng He, and Fucheng Liu^**

Author Affiliations

College of Physics Science and Technology, Hebei University, Baoding 071002, Hebei , China

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DOI: 10.3788/LOP202259.1323002 Cite this Article Set citation alerts

Yining Liu, Weili Fan, Xiaohan Hou, Zhicheng Wu, Yafeng He, Fucheng Liu. Annular Plasma Photonic Crystals with Different Filling Ratios in Dielectric Barrier Discharge[J]. Laser & Optoelectronics Progress, 2022, 59(13): 1323002 Copy Citation Text

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References

Yining Liu, Weili Fan, Xiaohan Hou, Zhicheng Wu, Yafeng He, Fucheng Liu. Annular Plasma Photonic Crystals with Different Filling Ratios in Dielectric Barrier Discharge[J]. Laser & Optoelectronics Progress, 2022, 59(13): 1323002

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