• Laser & Optoelectronics Progress
  • Vol. 55, Issue 4, 043101 (2018)
Chang'an Li*, Mingdong Yang, Benqing Quan, and Weilin Guan
Author Affiliations
  • Accelink Technologies Co., Ltd, Wuhan, Hubei 430205, China
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    DOI: 10.3788/LOP55.043101 Cite this Article Set citation alerts
    Chang'an Li, Mingdong Yang, Benqing Quan, Weilin Guan. Stress Simulation Analysis of Multilayer Film Deposition[J]. Laser & Optoelectronics Progress, 2018, 55(4): 043101 Copy Citation Text show less
    Edge misfit dislocation produced by lattice mismatch
    Fig. 1. Edge misfit dislocation produced by lattice mismatch
    Deformation of wafer
    Fig. 2. Deformation of wafer
    Flow chart of stress analysis of multilayer films
    Fig. 3. Flow chart of stress analysis of multilayer films
    Structure of multilayer films
    Fig. 4. Structure of multilayer films
    Stress distribution of multilayer films at each deposition stage. (a) Oxidized SiO2 films; (b) BPSG deposition film; (c) titanium deposition film; (d) SiNx deposition film
    Fig. 5. Stress distribution of multilayer films at each deposition stage. (a) Oxidized SiO2 films; (b) BPSG deposition film; (c) titanium deposition film; (d) SiNx deposition film
    Temperature /KCoefficient ofthermal expansion /(10-6 K-1)Youngmodulus /GPaPoissonratio
    3002.616129.990.28
    4003.25379.140.30
    5003.61437.050.31
    6003.84219.700.32
    7004.01611.910.32
    8004.1517.900.32
    9004.1855.600.32
    10004.2584.170.32
    11004.3233.220.32
    12004.3842.560.32
    13004.4422.080.32
    Table 1. Material parameters of Si
    Temperature /KCoefficient ofthermal expansion /(10-6 K-1)Youngmodulus /GPaPoissonratio
    2930.471.80.16
    3730.6271.40.157
    4730.7570.80.155
    5730.770.50.154
    6730.6570.20.153
    7730.670.10.153
    8730.570.050.152
    Table 2. Material parameters of SiO2
    MaterialCoefficient ofthermal expansion /(10-6 K-1)Youngmodulus /GPaPoissonratio
    Titanium8.61160.32
    SiNx2.453000.3
    BPSG3.43650.3
    Table 3. Material parameters of titanium, SiNx, and BPSG
    Chang'an Li, Mingdong Yang, Benqing Quan, Weilin Guan. Stress Simulation Analysis of Multilayer Film Deposition[J]. Laser & Optoelectronics Progress, 2018, 55(4): 043101
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