• Journal of Inorganic Materials
  • Vol. 34, Issue 8, 862 (2019)
Yi-Tian CHENG1、2, Wan-Qi QIU1、*, Ke-Song ZHOU1、2, Zhong-Wu LIU1, Dong-Ling JIAO1, Xi-Chun ZHONG1, and Hui ZHANG1
Author Affiliations
  • 1School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
  • 2The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China
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    DOI: 10.15541/jim20180473 Cite this Article
    Yi-Tian CHENG, Wan-Qi QIU, Ke-Song ZHOU, Zhong-Wu LIU, Dong-Ling JIAO, Xi-Chun ZHONG, Hui ZHANG. Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target[J]. Journal of Inorganic Materials, 2019, 34(8): 862 Copy Citation Text show less
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    Yi-Tian CHENG, Wan-Qi QIU, Ke-Song ZHOU, Zhong-Wu LIU, Dong-Ling JIAO, Xi-Chun ZHONG, Hui ZHANG. Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target[J]. Journal of Inorganic Materials, 2019, 34(8): 862
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