Yi-Tian CHENG, Wan-Qi QIU, Ke-Song ZHOU, Zhong-Wu LIU, Dong-Ling JIAO, Xi-Chun ZHONG, Hui ZHANG. Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target [J]. Journal of Inorganic Materials, 2019, 34(8): 862
Abstract
Set citation alerts for the article
Please enter your email address