[1] Timothy Brunner. Impact of lens aberrations on optical lithography[J]. IBM J Res Develop, 1997, 41: 57-67.
[2] Paul Graeupner, Reiner Garreis, Aksel Goehnermeier, et al.. Impact of wavefront errors on low k1 processes at extremely high NA [C]. SPIE, 2003, 5040: 119-130.
[3] Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, et al.. Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width [J]. Appl Opt, 2009, 48(2): 261-269.
[4] Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu, et al.. Even aberration measurement of lithographic projection system based on optimized phase-shifting marks [J]. Microelectron Eng, 2009, 86: 78-82.
[5] Hans van der Laan, Marcel Dierichs, Henk van Greevenbroek, et al.. Aerial image measurement methods for fast aberration set-up and illumination pupil verification [C]. SPIE, 2001, 4346: 394-407.
[6] Fan Wang, Xiangzhao Wang, Mingying Ma, et al.. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask [J]. Appl Opt, 2006, 45(2): 281-287.
[7] Bo Peng, Xiangzhao Wang, Zicheng Qiu, et al.. Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination [J]. Opt Commun, 2010, 283: 2309-2317.
[8] Tsuneyuki Hagiwara, Naoto Kondo, Irihama Hiroshi, et al.. Development of aerial image based aberration measurement technique [C]. SPIE, 2005, 5754: 1659-1669.
[9] Tu Yuanying, Wang Xiangzhao, Yan Guanyong. Odd aberration measurement technique based on peak intensity difference of aerial image [J]. Acta Optica Sinica, 2013, 33(5): 0512002.
[10] J P Kirk, C J Progler. Application of blazed gratings for determination of equivalent primary azimuthal aberration [C]. SPIE, 1999, 3679: 8-11.
[11] Mingying Ma, Xiangzhao Wang, Fan Wang. Aberration measurement of projection optics in lithographic tools based on two-beam interference theory [J]. Appl Opt, 2006, 45(32): 8200-8208.
[12] Lena Zavyalova, Bruce Smith. In-situ aberration monitoring using phase wheel targets [C]. SPIE, 2004, 5377: 172-184.
[13] Lifeng Duan, Xiangzhao Wang, Anatoly Bourov, et al.. In situ aberration measurement technique based on principal component analysis of aerial image [J]. Opt Express, 2011, 19(19): 18080-18090.
[14] Dongbo Xu, Xiangzhao Wang, Yang Bu, et al.. In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images [J]. Chin Opt Lett, 2012, 10(12): 121202.
[15] Jishuo Yang, Xiangzhao Wang, Sikun Li, et al.. High order aberration measurement technique based on quadratic Zernike model with optimized source [J]. Opt Eng, 2013, 52(5): 053603.
[16] M Born, E Wolf. Principles of Optics [M]. London: Cambridge University Press, 1999. 228-257.
[17] I T Jolliffe. Principal Component Analysis [M]. New York: Springer, 2002. 150-165.
[18] John O Rawlings, Sastry G Pantula, David A Dickey. Applied Regression Analysis: A Research Tool [M]. New York: Springer, 1998. 411-417.
[19] Chris A Mack. Fundamental Principles of Optical Lithography: the Science of Microfabrication [M]. Chichester: John Wiley & Sons, 2007. 56-71, 317-323.
[20] T Fühner, T Schnattinger, G Ardelean, et al.. Dr.LiTHO: a development and research lithography simulator [C]. SPIE, 2007, 6520: 65203F.
[21] Yang Jishuo, Li Sikun, Wang Xiangzhao, et al.. A projection lens aberration measurement method based on adaptive aerial image denoising [J]. Acta Optica Sinica, 2013, 33(1): 0111003.