A method to quickly detect defects in chemical vapor deposition (CVD)-prepared graphene is proposed. After transferring the graphene prepared by CVD to the target substrate, a graphene-gold substrate is prepared for surface plasmon polariton (SPP) imaging. Since SPP imaging is highly sensitive to the change of refractive index on the interface, it is used for detection of the graphene edge. Furthermore, as the surface defects of the graphene change the distribution of SPP fields, the SPP field distribution transfers to the far-field due to SPP leakage radiation effect, which is quickly imaged by charge-coupled device. Herein, the morphologies of graphene edge and surface, defects, and impurities are detected. This method is an improvement on previous low sensitivity, low speed as well as damage detection of traditional detection method, and it achieves high-sensitivity, high-speed, and nondestructive detection for graphene.