3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration

Heng Zhang; Sikun Li; Xiangzhao Wang; Wei Cheng

doi:10.3788/AOS201838.1222002

Journals >Acta Optica Sinica >Volume 38 >Issue 12 >Page 1222002 > Article

Acta Optica Sinica
Vol. 38, Issue 12, 1222002 (2018)

3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration

Heng Zhang^1、2、*, Sikun Li^1、2、*, Xiangzhao Wang^1、2、*, and Wei Cheng^1、2

Author Affiliations

¹ Laboratory of Information Optics and Optelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/AOS201838.1222002 Cite this Article Set citation alerts

Heng Zhang, Sikun Li, Xiangzhao Wang, Wei Cheng. 3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration[J]. Acta Optica Sinica, 2018, 38(12): 1222002 Copy Citation Text

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