[1] Smith A, McArthur B, Hunter Jr R. Method and apparatus for self-referenced projection lens distortion mapping: 6573986[P]. 2003-06-03.

[2] Li S X, Wang F. On-site measurement method of image quality of lithography and positioning accuracy of worktable: 101261451B[P]. 2011-06-29.

[3] Yang Z Y. The detection device and method for the magnification error and distortion of the projection objective: 101387833A[P]. 2009-03-18.

[4] Hagiwara T, Kondo N, Takane E, et al. Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method: 20020041377[P]. 2002-04-11.

[6] Lazar B M. ASML alignment sequence generator[D]. Eindhoven: Eindhoven University of Technology, 2012.

[7] Ding G M, Han C Y, Li S X. Device, method and apparatus for testing distortion and field curvature of objective lens: 110941144A[P]. 2020-03-31.

[8] Mizuno Y. Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing micro device: 6975387[P]. 2005-12-13.

[9] Ishikawa J. Exposure apparatus, exposure method, and device manufacturing method: 6914665[P]. 2005-07-05.

[10] Shu J W, Liu G G. A method for detecting distortion and field curvature of projection objective lens: 102540751A[P]. 2012-07-04.

[11] Li T P, He J L. A reticle-based projection objective lens performance test device and method: 105890875B[P]. 2018-12-14.

[20] Cheng J S. Study on interferometer measurement error model in wafer stage[D]. Wuhan: Huazhong University of Science and Technology, 2008.