Jing Du, Junbo Liu, Haiyang Quan, Song Hu. Displacement measurement analysis in distortion detection of lithography projection objective[J]. Opto-Electronic Engineering, 2023, 50(2): 220226
- Opto-Electronic Engineering
- Vol. 50, Issue 2, 220226 (2023)
Fig. 1. Schematic diagram of the projection objective distortion measurement
Fig. 2. Structural schematic diagram of the projection objective image quality detection platform
Fig. 3. Structural object picture of the test motion table
Fig. 4. Structural object picture of the beam scanning platform
Fig. 5. Internal structural object picture of the projection objective image quality detection platform
Fig. 6. Object picture of the dual-frequency laser interferometer
Fig. 7. Arrangement diagram of the dual-frequency laser interferometer
Fig. 8. Schematic diagram of the vertical abbe error
Fig. 9. Related constants of laser interferometer
Fig. 10. Constant temperature chamber and control cabinet of the micro-environment control system
Fig. 11. Schematic diagram of objective reference mirror
Fig. 12. Schematic diagram of the horizontal abbe error in distortion measurement
Fig. 13. Distortion distribution map
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Table 1. Instrument errors summary of the dual-frequency laser interferometer
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Table 2. Geometrical errors summary of the dual-frequency laser interferometer
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Table 3. System parameters of the micro-environment control system
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Table 4. Environmental errors summary of the dual-frequency laser interferometer
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Table 5. Positon measurement reproducibility of the image quality detection platform
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Table 6. Positon measurement reproducibility of the image quality detection platform (micro-environment control system off)
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